Grounded electrode for a plasma processing apparatus



FIG. 1 is a front, top and right side perspective view of a grounded electrode for a plasma processing apparatus according to the design;

FIG. 2 is a rear, bottom and left side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 7; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9.

The broken lines show the boundary of enlarged portions and form no part of the claimed design. 

CLAIM The ornamental design for a grounded electrode for a plasma processing apparatus, as shown and described. 